International Patent System

The Galactic Assembly,

Observing that within the United Federations, there is an absence of a system that prevents the blatant theft of original creations, ideas, and materials;

Believing that in spite of this, a system can easily be created to rectify this problem;

Observing that this Assembly would be hypocritical to not create legislation on the subject when it easily possesses the ability to do so;

Hereby,

1. Defines, for the purpose of this resolution:

a. "Patentable Material" as an original, artificial object or technology that is in the process of being/already is created,
b. "Patent" as the international legal right to a Patentable Material that prevents non-consensual use, recreation, or copying of the aforementioned material;

2. Declares that any Patentable Material may be patented by:

a. The original creator of the Patentable Material,
b. The closest relation(s) to the original creator, should the original creator be unavailable.

3. Prohibits the use of a Patented Material by anyone other than the original creator unless they receive
direct permission from said creator, at the risk of:

a. Fine amounting to the positive monetary or material gain made by the violation, plus the value of the patent,
b. Ceasing operations in galactic assembly nations if such compensation is not provided

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Authored by; New anovia
Co-authored by; Voopmont

Vote tally:
For - 11
Against - 1
Abstain - 0